Project: Surface science studies of semiconductor and metals deposited in-situ

I will be doing surface science studies of semiconductor and metals deposited in-situ. I will learn to prepare these surfaces by molecular beam epitaxy and apply a number of surface science tools to their study. Initially, emphasis will be made on x-ray photoelectron spectroscopy (XPS) and Auger electron spectroscopy (AES). Part of my efforts will be to use and extend models of XPS and AES analysis for determining interfacial reactions as a function of film deposition for films thinner than the photoelectron escape depth. I will utilize scanning tunneling microscopy to determine the atomic scale surface structure of the structures.