STEPHEN A. CAMPBELL

Professor, Electrical and Computer Engineering Contact Info: Phone: (612) 625-6608 Office: 5-129 EE/CSci Email: Campbell@ece.umn.edu

Professional Preparation University of St. Thomas, Physics, B.A., 1976 Northwestern University, Physics, Ph.D., 1981 Professional Appointments Director, UMN Microtechnology Laboratory, 1999-present Professor, Electrical and Computer Engineering, UMN, 1996-present Associate Professor, Electrical Engineering, UMN, 1991-1996 Assistant Professor, Electrical Engineering, UMN, 1985-1991 Manager, Silicon Research, Sperry Corporation, 1983-1985 Device Engineer, Sperry Corporation, 1981-1982 Selected Publications S.A. Campbell, T.Z. Ma, R. Smith, W.L. Gladfelter, F. Chen, "High Mobility HfO2 N- and P- Channel Transistors,” Microelectronic Engineering 59, 361 (2001) T. Kim, S-M. Suh, S.L. Girshick, M.R. Zachariah, P.H. McMurry, R.M. Rassel, S.A. Campbell, "Particle Formation During Low-Pressure Chemical Vapor Deposition From Silane and Oxygen: Measurements, Modeling, and Film Properties," JVST A, in press S.A. Campbell, T. Ma, R. Smith, N. Hoilien, B. He, W.L. Gladfelter, C. Hobbs, C. Taylor, M. Coppel, “Group IVB Metal Oxides: TiO2, ZrO2, and HfO2 Deposited from Nitratos As High Permittivity Gate Insulators,” IEEE Transactions on Electron Devices 48, 2348 (2001) S. Nijhawan, P.H. McMurry, S.A. Campbell, "Particle Transport in a Parallel-Plate Semiconductor Reactor: Chamber Modification and Design Criterion for Enhanced Process Cleanliness," JVST A 18, 2198 (2000) N.P. Rao, S. Nijhawan, T. Kim, Z. Wu, S.A. Campbell, D. Kittelson, P. McMurry, "Monitoring of Particle Generation During the Low Pressure Chemical Vapor Deposition of Borophosphosilicate Glass Films," J. Electrochemical Soc. 145, 2051 (1998) H.S. Kim, S.A. Campbell, D.C. Gilmer, “Determination of Effects of Deposition and Anneal Properties for Tetranitratotitiantium Deposited TiO2 Dielectrics,” J. Appl. Phys. 85, 3278 (1999) S.A. Campbell, H.S. Kim, D. Gilmer, B. He, T. Ma, W.L. Gladfelter, “TiO2 Based Gate Insulators,” IBM J. Res. Dev. (Invited Paper) 43, 383 (1999) R. Smith, T. Ma, N. Hoilien, L.Y. Tsung, M.J. Bevan, L. Colombo, J. Roberts, S.A. Campbell, W.L. Gladfelter, “Chemical Vapor Deposition of the Oxides of Titanium, Zirconium, and Hafnium for Use as High k Materials in Microelectronic Devices. A Carbon-Free Precursor for the Synthesis of Hafnium Dioxide,” Adv. Materials for Optics and Electronics 10, 105 (2000) R.C. Smith, N. Hoilien, C.J. Taylor, T. Ma, S.A. Campbell, J.T. Roberts, M. Copel, D.A. Buchanan, M. Gribelyuk, W.L. Gladfelter, "Low Temperature Chemical Vapor Deposition of ZrO2 on Si(100) Using Anhydrous Zirconium(IV) Nitrate," J. Electrochem. Soc. 147, 3472 (2000) N.P. Rao, Z. Wu, S. Nijhawan, P. Ziemann, S.A. Campbell, D.B. Kittelson, P. McMurry, "Investigation of Particle Formation During the Plasma Enhanced Chemical Vapor Deposition of Amorphous Silicon, Oxide and Nitride Films," Journal of Vacuum Sci. & Techn. B 16, 483 (1998) Selected Awards IBM University Partnership Award, 1998 Outstanding EE Instructor Award, Inst of Technology Student Board, 1991 Presidential Young Investigator (National Science Foundation) 1989 Synergistic Activities Authored a widely used text on microfabrication, The Science and Engineering of Microelectronic Fabrication (Oxford) 1996, 2001 Editor for Journal of Semiconductor Science and Technology, 2001 - present