Professional Preparation:

Professional Appointments

Department Head, Chemistry, 2005-present
Distinguished McKnight University Professor, 2005-present
Professor, Chemistry, UMN, 2003-present
Associate Professor, Chemistry, UMN, 1996-2003
Assistant Professor, Chemistry, UMN, 1990-1996

Selected Publications

Y.-C. Liao and J. T. Roberts, "Self-Assembly of Organic Monolayers on Aerosolized Silicon Nanoparticles", J. Am. Chem. Soc., 128, 9061-9065 (2006)

Y.-C. Liao, A. M. Nienow , and J. T. Roberts, "Surface Chemistry of Aerosolized Nanoparticles: Thermal Oxidation of Silicon", J. Phys. Chem. B, 110, 6190-6197 (2006)

A. M. Nienow and J. T. Roberts, "Chemical Vapor Deposition of Zirconium Oxide on Aerosolized Silicon Nanoparticles", Chem. Mater., 18, 5571-5577 (2006)

J. Holm and J. T. Roberts, "Surface Chemistry of Aerosolized Silicon Nanoparticles: Evolution and Desorption of Hydrogen from 6 nm Diameter Particles", J. Am. Chem. Soc., 129, 2496-2503 (2007)

B. Zhang, S. L. Girshick, Y.-C. Liao, and J. T. Roberts, "Growth of Coatings on Nanoparticles by Photoinduced Chemical Vapor Deposition", J. Nanpart. Res., Online First (DOI 10.1007/s11051-007-9238-2).

A. Nienow, J. T. Roberts, and M. Zachariah, "Surface Chemistry of Nanometer-Sized Aerosol Particles: Reactions of Molecular Oxygen with 30 nm Soot Particles as a Function of Oxygen Pressure", J. Phs. Chem. B., 109, 5561-55568 (2005)

B. Xia, F. Chen, S. A. Campbell, J. T. Roberts, and W. L. Gladfelter, "Combinatorial CVD of Zirconium, Hafnium, and Tin Dioxide Mixtures for Applications as High-k Materials", Chem. Vap. Deposition, 10, 195-200 (2004)

C. Dykstra, S. A. Campbell, J. T. Roberts, and W. L. Gladfelter, "CVD of Ti_xSi_1-xO₂ Fiilms: Precursor Chemistry Impacts Film Composition", Chem. Vap. Deposition, 9, 79-86 (2003)

K. J. Higgins, H. Jung, D. B. Kittelson, J. T. Roberts, and M. R. Zachariah, "Kinetics of Diesel Particle Oxidation: A Tandem DMA Study", Environ. Sci. Technol., 37, 1949-1954 (2003)

R. C. Smith, N. Hoilien, J. Chien, S. A. Campbell, J. T. Roberts, and W. L. Gladfelter, "Combinatorial Chemical Vapor Deposition: Achieving Compositional Spreads of Titanium, Tin and Hafnium Oxides by Balancing Reactor Fluid Dynamics and Deposition Kinetics" Chem. Mater., 14, 1269-1276 (2002).