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Institute of Technology

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Wayne Gladfelter

Institute of Technology Distinguished Professor
Office: 241b Smith Hall
Phone: 612-624-4391
Email: gladfelt@chem.umn.edu
Departmental Page ¦ Group Website

Professional Preparation:

B.S., Mineral Engineering Chemistry, Colorado School of Mines, 1975
The Pennsylvania State University, Chemistry, Ph. D., 1978
California Institute of Technology, Inorganic Chemistry, 1978 - 1979 Office:

Professional Appointments

Professor of Chemistry, University of Minnesota, 1988-present
Department Chair, Chemistry, 1999-2005
Associate Professor of Chemistry, University of Minnesota, l984-1988
Assistant Professor of Chemistry, University of Minnesota, l979-l984


Selected Publications

Luo, B. E. Kucera, W. L. Gladfelter, "Syntheses and X-ray crystal structures of zinc complexes with an amidodiamine ligand" Polyhedron, 25, 279 (2006) (invited paper for special Malcolm Chisholm issue).

B. L. Kormos, C. J. Cramer, W. L. Gladfelter, "Pseudo-two-dimensional Structures (HXYH)3n2H6n (XY = GaN, SiC, GeC, SiSi, GeGe; n = 1 - 3): Density Functional Characterization of Structures and Energetics" J. Phys. Chem. A, 110, 494 (2006).

L. Zhong, W. L. Daniel, Z. Zhang, S. A. Campbell, W. L. Gladfelter, "Atomic Layer Depostion, Characterization and Dielectric Properties of HfO2/SiO2 Nanolaminates and Comparisons to Their Homogeneous Mixtures" Chem. Vap. Deposition, 12, 143 (2006).

B. Luo, B. E. Kucera, W. L. Gladfelter, ÒMono- and Digallane Complexes of a Tridentate Amido-diamine Ligand,Ó Chem. Commun. 3463 (2005).
v B. L. Kormos, J. A. Jegier, P. Ewbank, U. Pernisz, V. G. Young Jr., C. J. Cramer, W. L. Gladfelter, ÒOligomeric Rods of Alkyl- and Hydridogallium Imides,Ó J. Am. Chem. Soc. 127, 1493 (2005).

Li, M.; Agustin, M. P.; Klenov, D. O.; Zhang, Z.; Stemmer, S.; Gladfelter, W. L.; Campbell, S. A. "Electrical and Material Characterization of High Permittivity HfxTi1-xO2 Gate Insulators" J. Appl. Phys., 98, 054506/1 (2005).

L. Zhong, Z. Zhang, S. A. Campbell, W. L. Gladfelter, ÒCombinatorial CVD of ZrO2 or HfO2 Compositional Spreads with SiO2 for High k Dielectrics,Ó J. Mater. Chem. 14, 3203 (2004).

L. Zhong, F. Chen, S. A. Campbell, W. L. Gladfelter, ÒNanolaminates of Zirconia and Silica Using Atomic Layer Deposition,Ó Chem. Mater. 16, 1098 (2004).

B. Xia, F. Chen, S. A. Campbell, J. T. Roberts, W. L. Gladfelter, ÒCombinatorial CVD of Zirconium, Hafnium and Tin Dioxide Mixtures for Application as High k Materials,Ó Chem. Vap. Deposition 10, 195 (2004).

B. Xia, R. C. Smith, T. L. Moersch, W. L. Gladfelter, ÒBalancing Reactor Fluid Dynamics and Deposition Kinetics to Achieve Compositional Variation in Combinatorial Chemical Vapor Depositions,Ó Appl. Surf. Sci. 223(1-3), 14 (2004).